INTERFACE REACTION OF B2O3-SI SYSTEM AND BORON DIFFUSION INTO SILICON

被引：70

作者：

ARAI, E ^{[1
]}

TERUNUMA, Y ^{[1
]}

机构：

[1] NIPPON TELEGRAPH & TEL PUBL CORP,ELECT COMMUN LAB,MUSASHINO,TOKYO,JAPAN

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1973年 / 120卷 / 07期

关键词：

D O I：

10.1149/1.2403611

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：980 / 987

页数：8

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