OPTICAL THIN-FILMS OBTAINED BY PLASMA-INDUCED CHEMICAL VAPOR-DEPOSITION

被引：10

作者：

TURNER, P

HOWSON, RP

BISHOP, CA

机构：

来源：

THIN SOLID FILMS | 1981年 / 83卷 / 02期

关键词：

D O I：

10.1016/0040-6090(81)90675-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：253 / 258

页数：6

共 9 条

[1] COMPOSITION AND CONDUCTIVITY OF FLUORINE-DOPED CONDUCTING INDIUM OXIDE-FILMS PREPARED BY REACTIVE ION PLATING [J].

AVARITSIOTIS, JN ;

HOWSON, RP .

THIN SOLID FILMS, 1981, 77 (04) :351-357

[2] EFFECT OF SUBSTRATE TEMPERATURE ON OPTICAL-PROPERTIES OF REACTIVELY EVAPORATED SILICON-OXIDE FILMS [J].

BRADFORD, AP ;

HASS, G ;

MCFARLAND, M ;

RITTER, E .

THIN SOLID FILMS, 1977, 42 (03) :361-367

[3] REACTIVE ION PLATING OF METAL-OXIDES ONTO INSULATING SUBSTRATES [J].

HOWSON, RP ;

AVARITSIOTIS, JN ;

RIDGE, MI ;

BISHOP, CA .

THIN SOLID FILMS, 1979, 58 (02) :379-384

[4] REFRACTIVE-INDEXES OF TIO2 FILMS PRODUCED BY REACTIVE EVAPORATION OF VARIOUS TITANIUM-OXYGEN PHASES [J].

PULKER, HK ;

PAESOLD, G ;

RITTER, E .

APPLIED OPTICS, 1976, 15 (12) :2986-2991

[5] THE APPLICATION OF ION PLATING TO THE CONTINUOUS COATING OF FLEXIBLE PLASTIC SHEET [J].

RIDGE, MI ;

STENLAKE, M ;

HOWSON, RP ;

BISHOP, CA .

THIN SOLID FILMS, 1981, 80 (1-3) :31-39

[6] FEATURES OF AND INSITU MEASUREMENTS ON ABSORBING TIOX FILMS PRODUCED BY REACTIVE DC MAGNETRON-PLASMATRON SPUTTERING [J].

SCHILLER, S ;

BEISTER, G ;

SCHNEIDER, S ;

SIEBER, W .

THIN SOLID FILMS, 1980, 72 (03) :475-483

[7]

Turner P. G., 1980, Low-Energy Ion Beams, 1980. Second International Conference on Low-Energy Ion Beams, P229

[8]

VOSSON JL, 1978, THIN FILM PROCESSES

[9]

WEISSMANTEL C, 1977, 7TH P INT VAC C 3RD, P1533

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