PASSIVATION ANALYSIS OF MICROMECHANICAL SILICON STRUCTURES OBTAINED BY ELECTROCHEMICAL ETCH-STOP

被引：14

作者：

GOTZ, A ^{[1
]}

ESTEVE, J ^{[1
]}

BAUSELLS, J ^{[1
]}

MARCO, S ^{[1
]}

SAMITIER, J ^{[1
]}

MORANTE, JR ^{[1
]}

机构：

[1] UNIV BARCELONA,DEPT FIS APLICADA & ELECTR,LCMM,E-08028 BARCELONA,SPAIN

来源：

SENSORS AND ACTUATORS A-PHYSICAL | 1993年 / 37-8卷

关键词：

D O I：

10.1016/0924-4247(93)80126-2

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The electrochemical etch stop in conjunction with the use of implantations and diffusions provides new possibilities for fabrication of microstructures. The different results obtained with the three- or four-electrode configuration are discussed, as well as the effect of light in every case. The observed phenomena are interpreted in terms of the electrochemical reaction mechanisms. The technological limits of the technique are also commented.

引用

页码：744 / 750

页数：7

共 16 条

[1] BIPOLAR EFFECTS IN THE FABRICATION OF SILICON MEMBRANES BY THE ANODIC ETCH STOP [J].

ANDREWS, MK ;

TURNER, GC .

SENSORS AND ACTUATORS A-PHYSICAL, 1991, 29 (01) :49-57

[2]

DING X, 1990, SENSOR ACTUAT A-PHYS, V21, P866

[3]

DING X, 1990, JUN P IEEE SOL STAT, P861

[4] ACCURATE INFRARED-SPECTROSCOPY ANALYSIS IN BACK-SIDE DAMAGED SILICON-WAFERS [J].

GARRIDO, B ;

MORENO, JA ;

SAMITIER, J ;

MORANTE, JR .

APPLIED SURFACE SCIENCE, 1993, 63 (1-4) :236-239

[5]

HUSTER R, 1990, SENSOR ACTUAT A-PHYS, V21, P899

[6]

JANZ GJ, 1961, REFERENCE ELECTRODES, P189

[7] STUDY OF ELECTROCHEMICAL ETCH-STOP FOR HIGH-PRECISION THICKNESS CONTROL OF SILICON MEMBRANES [J].

KLOECK, B ;

COLLINS, SD ;

DEROOIJ, NF ;

SMITH, RL .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1989, 36 (04) :663-669

[8] ANALYSIS OF NONLINEARITY IN HIGH-SENSITIVITY PIEZORESISTIVE PRESSURE SENSORS [J].

MARCO, S ;

SAMITIER, J ;

RUIZ, O ;

MORANTE, JR ;

ESTEVE, J .

SENSORS AND ACTUATORS A-PHYSICAL, 1993, 37-8 :790-795

[9]

MCNEIL VM, 1990, JUN IEEE SOL STAT SE, P92

[10] NEW PHENOMENA OBSERVED IN ELECTROCHEMICAL MICROMACHINING OF SILICON [J].

OZDEMIR, CH ;

SMITH, JG .

SENSORS AND ACTUATORS A-PHYSICAL, 1992, 34 (01) :87-93

← 1 2 →