THERMAL-OXIDATION OF BETA-TA BELOW 500-DEGREES-C

被引:12
作者
SATO, S
INOUE, T
SASAKI, H
机构
关键词
D O I
10.1016/0040-6090(81)90154-1
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:21 / 30
页数:10
相关论文
共 16 条
[1]   THE OXIDATION OF SPUTTERED TANTALUM FILMS [J].
BASSECHES, H .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1962, 109 (06) :475-479
[2]  
CHARSCHAN SS, 1963, W ELECT ENG, V7, P9
[3]  
CROSET M, 1971, J VAC SCI TECHNOL, V9, P165
[4]   FACTORS CONTROLLING STRUCTURE OF SPUTTERED TA FILMS [J].
FEINSTEIN, LG ;
HUTTEMANN, RD .
THIN SOLID FILMS, 1973, 16 (02) :129-145
[5]  
KHITROVA VI, 1966, SOV PHYS CRYSTALLOGR, V11, P204
[6]  
KOFSTAD P, 1962, J I MET, V91, P209
[7]   TANTALUM-FILM TECHNOLOGY [J].
MCLEAN, DA ;
SCHWARTZ, N ;
TIDD, ED .
PROCEEDINGS OF THE IEEE, 1964, 52 (12) :1450-&
[8]  
PAHNBERG PW, 1971, J VAC SCI TECHNOL, V9, P160
[9]  
PAHNBERG PW, 1973, J VAC SCI TECHNOL, V10, P274
[10]  
PAWEL RE, 1963, J ELECTROCHEM SOC, V111, P551