MONTE-CARLO STUDIES OF OHMIC HOLE MOBILITY IN SILICON AND GERMANIUM - EXAMINATION OF THE OPTICAL PHONON DEFORMATION POTENTIAL

被引:38
作者
HINCKLEY, JM
SINGH, J
机构
[1] Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor
关键词
D O I
10.1063/1.357373
中图分类号
O59 [应用物理学];
学科分类号
摘要
Monte Carlo methods which have been widely used for studying high field electron and hole transport, so far have not been applied to the complex problem of Ohmic hole transport. We present a versatile generalization of the Monte Carlo approach for Ohmic hole mobility studies and apply it to pure silicon and germanium. In particular, we examine the role of the optical phonon deformation potential d0 in controlling the temperature dependence of the mobility.
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页码:4192 / 4200
页数:9
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