SUPPRESSION OF SURFACE-TOPOGRAPHY DEVELOPMENT IN ION-MILLING OF SEMICONDUCTORS

被引：36

作者：

BULLELIEUWMA, CWT

ZALM, PC

机构：

[1] Philips Research Lab, Eindhoven, Neth, Philips Research Lab, Eindhoven, Neth

来源：

SURFACE AND INTERFACE ANALYSIS | 1987年 / 10卷 / 04期

关键词：

HUMMOCKS - ION MILLING - SURFACE TOPOGRAPHY;

D O I：

10.1002/sia.740100406

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：210 / 215

页数：6

共 12 条

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