ON THE OUT-DIFFUSION OF OXYGEN FROM SILICON

被引：32

作者：

GAWORZEWSKI, P ^{[1
]}

RITTER, G ^{[1
]}

机构：

[1] VEB HALBEITERWERK FRANKFURT,FRANKFURT,FED REP GER

来源：

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1981年 / 67卷 / 02期

关键词：

D O I：

10.1002/pssa.2210670220

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：511 / 516

页数：6

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