SILICIDE FORMATION FROM TERNARY METAL METAL SILICON SYSTEMS

被引：14

作者：

SETTON, M

VANDERSPIEGEL, J

机构：

[1] UNIV PENN,RES STRUCT MATTER LAB,PHILADELPHIA,PA 19104

[2] UNIV PENN,DEPT ELECT ENGN,PHILADELPHIA,PA 19104

来源：

THIN SOLID FILMS | 1988年 / 156卷 / 02期

关键词：

D O I：

10.1016/0040-6090(88)90330-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：351 / 363

页数：13

相关论文

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