GROWTH-KINETICS OF SILICON THERMAL NITRIDATION

被引:47
作者
WU, CY [1 ]
KING, CW [1 ]
LEE, MK [1 ]
CHEN, CT [1 ]
机构
[1] IND TECHNOL RES INST,ELECTR RES & SERV ORG,IC DEV CTR,HSIN CHU,TAIWAN
关键词
D O I
10.1149/1.2124207
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
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页码:1559 / 1563
页数:5
相关论文
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