NITROGEN REACTION AT A SILICON-SILICON DIOXIDE INTERFACE

被引：94

作者：

RAIDER, SI ^{[1
]}

GDULA, RA ^{[1
]}

PETRAK, JR ^{[1
]}

机构：

[1] IBM CORP,SYST PROD DIV,E FISHKILL,HOPEWELL JUNCTION,NY 12533

来源：

APPLIED PHYSICS LETTERS | 1975年 / 27卷 / 03期

关键词：

D O I：

10.1063/1.88389

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：150 / 152

页数：3

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