KINETIC-MODEL FOR RADIO-FREQUENCY PLASMA-ACTIVATED CHEMICAL VAPOR-DEPOSITION

被引：18

作者：

TURBAN, G

CATHERINE, Y

机构：

来源：

THIN SOLID FILMS | 1978年 / 48卷 / 01期

关键词：

D O I：

10.1016/0040-6090(78)90331-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

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页码：57 / 65

页数：9

相关论文

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