SUB-30-PS ECL CIRCUIT OPERATION AT LIQUID-NITROGEN TEMPERATURE USING SELF-ALIGNED EPITAXIAL SIGE-BASE BIPOLAR-TRANSISTORS

被引:21
作者
CRESSLER, JD
COMFORT, JH
CRABBE, EF
PATTON, GL
WAI, L
SUN, JYC
STORK, JMC
MEYERSON, BS
机构
[1] IBM Research Division, Thomas J. Watson Research Center, Yorktown Heights, NY
关键词
D O I
10.1109/55.75752
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report the first operation of ECL circuits at liquid-nitrogen temperature using self-aligned epitaxial SiGe-base bipolar transistors. A minimum ECL gate delay of 28.1 ps at 84 K was measured, and is essentially unchanged from its room-temperature value of 28.2 ps at 310 K. This delay number was achieved under full logic-swing (500 mV) conditions and represents an improvement of greater than a factor of 2 over the best reported value for 84-K operation. Lower power ECL circuits have switching speeds as fast as 51 ps at 2.2 mW (112-fJ power-delay product) at 84 K. These results suggest that silicon-based bipolar technology is suitable for very high-speed applications in cryogenic computer systems.
引用
收藏
页码:166 / 168
页数:3
相关论文
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