VACUUM-ARC DEPOSITION OF CARBON THIN-FILMS IN A LOW-PRESSURE OF HYDROGEN

被引：3

作者：

DEAZEVEDO, MD

MEUNIER, JL

机构：

[1] Plasma Technology Research Center (CRTP), Department of Chemical Engineering, McGill University, Montreal, PQ, H3A 2A7

来源：

IEEE TRANSACTIONS ON PLASMA SCIENCE | 1991年 / 19卷 / 05期

关键词：

D O I：

10.1109/27.108406

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

Results on the vacuum arc deposition (VAD) of thin carbon films on silicon, tungsten, and nickel are presented for different hydrogen pressures in the arc chamber. Raman and Auger electron spectroscopy and SEM analysis show that a large variety of film structures can be obtained. Highly oriented pyrolytic graphite is formed at high hydrogen pressure and low substrate temperature. Vacuum deposition resulted in diamond-like structure. Evidence of the presence of multicrystalline spheres of diamond in some films is also presented.

引用

页码：734 / 739

页数：6

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