CARBON-MONOXIDE PROMOTED CHEMICAL VAPOR-DEPOSITION OF COPPER

被引:13
作者
KUMAR, R [1 ]
MAVERICK, AW [1 ]
机构
[1] LOUISIANA STATE UNIV,DEPT CHEM,BATON ROUGE,LA 70803
关键词
D O I
10.1021/cm00027a004
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Chemical vapor deposition of Cu, using (hfac)-Cu(I)(COD) as precursor and CO or CO/H-2 (1:1 v/v, 1 atm) as carrier gas, occurs with source at 30-35-degrees-C and substrate at 170-175-degrees-C. These temperatures are ca. 30-degrees-C lower than required with H-2 carrier. The enhanced deposition is attributed to the intermediate formation of (hfac)Cu(I)(CO). CuCVD also occurs with (hfac)Cu(I)(CO), dissolved in THF, as precursor.
引用
收藏
页码:251 / 253
页数:3
相关论文
共 26 条
[1]   BINUCLEAR COMPLEXES .3. SYNTHESIS AND REACTIVITY OF A FAMILY OF COPPER MONOOXYGENASE MODEL SYSTEMS [J].
CASELLA, L ;
GULLOTTI, M ;
PALLANZA, G ;
RIGONI, L .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1988, 110 (13) :4221-4227
[2]   THE CHEMISTRY OF BETA-DIKETONATE COPPER(I) COMPOUNDS .3. THE SYNTHESIS OF (BETA-DIKETONATE) CU(1,5-COD) COMPOUNDS, THE SOLID-STATE STRUCTURE AND DISPROPORTIONATION OF HEXAFLUOROACETYLACETONATO (1,5-CYCLOOCTADIENE)COPPER(I), (HFAC)CU(1,5-COD) [J].
CHI, KM ;
SHIN, HK ;
HAMPDENSMITH, MJ ;
DUESLER, EN ;
KODAS, TT .
POLYHEDRON, 1991, 10 (19) :2293-2299
[3]   SURFACE-ANALYSIS STUDIES OF COPPER CHEMICAL VAPOR-DEPOSITION FROM 1,5-CYCLOOCTADIENE-COPPER(I)-HEXAFLUOROACETYLACETONATE [J].
COHEN, SL ;
LIEHR, M ;
KASI, S .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1992, 10 (04) :863-868
[4]   SELECTIVITY IN COPPER CHEMICAL VAPOR-DEPOSITION [J].
COHEN, SL ;
LIEHR, M ;
KASI, S .
APPLIED PHYSICS LETTERS, 1992, 60 (13) :1585-1587
[5]  
COHEN SL, 1992, APPL PHYS LETT, V50, P60
[6]   ALKENE AND CARBON-MONOXIDE DERIVATIVES OF COPPER(I) AND SILVER(I) BETA-DIKETONATES [J].
DOYLE, G ;
ERIKSEN, KA ;
VANENGEN, D .
ORGANOMETALLICS, 1985, 4 (05) :830-835
[7]   PREPARATION OF COPPER(I) CARBONYL-COMPLEXES DERIVED FROM SULFONIC-ACIDS - CRYSTAL-STRUCTURE OF CU(CO)C2H5SO3 [J].
DOYLE, G ;
ERIKSEN, KA ;
VANENGEN, D .
INORGANIC CHEMISTRY, 1983, 22 (20) :2892-2895
[8]  
Dubois L. H., 1992, Advanced Metallization for ULSI Applications (Formerly Workshop on Tungsten and Other Advanced Metals for ULSI Applications) Proceedings of the Conference, P375
[9]   SELECTIVITY AND COPPER CHEMICAL VAPOR-DEPOSITION [J].
DUBOIS, LH ;
ZEGARSKI, BR .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1992, 139 (11) :3295-3299
[10]   Laser-Induced Deposition of Copper from (Triethylphosphine)cyclopentadienyl-copper(I) [J].
Dupuy, C. G. ;
Beach, D. B. ;
Hurst, J. E., Jr. ;
Jasinski, J. M. .
CHEMISTRY OF MATERIALS, 1989, 1 (01) :16-18