STUDY OF THE NICKEL-ALUMINA INTERFACE BY XPS AND XAES

被引：17

作者：

EALET, B

GILLET, E

NEHASIL, V

MOLLER, PJ

机构：

[1] FAC SCI & TECH ST JEROME,SERMEC,MICROSCOPIE & DIFFRACT ELECTR LAB,F-13397 MARSEILLE 20,FRANCE

[2] UNIV COPENHAGEN,HC ORSTED INST,DEPT CHEM,DK-2100 COPENHAGEN O,DENMARK

来源：

SURFACE SCIENCE | 1994年 / 318卷 / 1-2期

关键词：

D O I：

10.1016/0039-6028(94)90350-6

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The first steps of the formation of the nickel-alumina interface were characterized by Auger electron spectroscopy, X-ray photoelectron spectroscopy and by Auger parameter (alpha') analysis. gamma-alumina thin films were used as support to avoid static charge problems which occur on bulk surfaces. The electronic structure of the interface yields evidence for the formation of oxide phases which give an ionic character to the nickel-alumina bonding.

引用

页码：151 / 157

页数：7

共 43 条

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