PT/TI PARA-INGAASP NONALLOYED OHMIC CONTACT FORMED BY RAPID THERMAL-PROCESSING

被引：25

作者：

KATZ, A ^{[1
]}

DAUTREMONTSMITH, WC ^{[1
]}

THOMAS, PM ^{[1
]}

KOSZI, LA ^{[1
]}

LEE, JW ^{[1
]}

RIGGS, VG ^{[1
]}

BROWN, RL ^{[1
]}

ZILKO, JL ^{[1
]}

LAHAV, A ^{[1
]}

机构：

[1] AT&T BELL LABS, READING, PA 19604 USA

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 65卷 / 11期

关键词：

D O I：

10.1063/1.343291

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：4319 / 4323

页数：5

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