FILM THICKNESS DEPENDENCE OF MICROWAVE SURFACE-RESISTANCE FOR YBA2CU3O7 THIN-FILMS

被引:19
作者
MOGROCAMPERO, A [1 ]
TURNER, LG [1 ]
KADIN, AM [1 ]
MALLORY, DS [1 ]
机构
[1] UNIV ROCHESTER,DEPT ELECT ENGN,ROCHESTER,NY 14627
关键词
D O I
10.1063/1.353764
中图分类号
O59 [应用物理学];
学科分类号
摘要
Microwave surface resistance close to 10 GHz has been measured as a function of temperature for epitaxial thin films of YBa2Cu3O7 (YBCO) on LaAlO3 in the film thickness range of 0.2-0.8 mum. The films were made by a reduced-temperature post-anneal technique. The surface resistance (R(s)) scaled to 10 GHz decreases with increasing film thickness as is expected due to the finite film thickness with respect to the magnetic penetration depth. Below about 70 K there is an increase in R(s) for the thickest films, attributed to a change in microstructure from c axis normal to the substrate plane, to c axis in the plane of the substrate; the resulting minimum in R(s) occurs at a film thickness of 0.6 mum. The critical current density (J(c)) at 77 K is highest for the thinner films, so that films with the highest J(c) do not have the lowest measured R(s). These results suggest that the optimum YBCO film thickness for microwave devices patterned from these films may be about 0.6 mum, depending on operating temperature.
引用
收藏
页码:5295 / 5297
页数:3
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共 17 条
  • [1] DEPENDENCE OF CRYSTALLINE ORIENTATION ON FILM THICKNESS IN LASER-ABLATED YBA2CU3O7-DELTA ON LAALO3
    CARIM, AH
    BASU, SN
    MUENCHAUSEN, RE
    [J]. APPLIED PHYSICS LETTERS, 1991, 58 (08) : 871 - 873
  • [2] SURFACE-RESISTANCE OF LASER-DEPOSITED YBA2CU3O7 FILMS
    DRABECK, L
    HOLCZER, K
    GRUNER, G
    CHANG, JJ
    SCALAPINO, DJ
    INAM, A
    WU, XD
    NAZAR, L
    VENKATESAN, T
    [J]. PHYSICAL REVIEW B, 1990, 42 (16): : 10020 - 10029
  • [3] GAERZON FH, 1992, J ELECTRON MATER, V21, P483
  • [4] THE EFFECTIVE MICROWAVE SURFACE IMPEDANCE OF HIGH-TC THIN-FILMS
    KLEIN, N
    CHALOUPKA, H
    MULLER, G
    ORBACH, S
    PIEL, H
    ROAS, B
    SCHULTZ, L
    KLEIN, U
    PEINIGER, M
    [J]. JOURNAL OF APPLIED PHYSICS, 1990, 67 (11) : 6940 - 6945
  • [5] THICKNESS AND ANNEALING DEPENDENCE OF THE SUPERCONDUCTING TRANSITION-TEMPERATURE OF YBA2CU3O7-X THIN-FILMS ON OXIDIZED SILICON AND POLYCRYSTALLINE ALUMINA SUBSTRATES
    MOGROCAMPERO, A
    TURNER, LG
    KENDALL, G
    [J]. APPLIED PHYSICS LETTERS, 1988, 53 (25) : 2566 - 2568
  • [6] FILM THICKNESS DEPENDENCE OF CRITICAL CURRENT-DENSITY AND MICROSTRUCTURE FOR EPITAXIAL YBA2CU3O7-X FILMS
    MOGROCAMPERO, A
    TURNER, LG
    HALL, EL
    LEWIS, N
    PELUSO, LA
    BALZ, WE
    [J]. SUPERCONDUCTOR SCIENCE & TECHNOLOGY, 1990, 3 (02) : 62 - 66
  • [7] SUPERIOR MICROWAVE PROPERTIES BY POSTANNEALING YBA2CU3O7 THIN-FILMS AT LOW OXYGEN PARTIAL-PRESSURE
    MOGROCAMPERO, A
    TURNER, LG
    KADIN, AM
    MALLORY, DS
    [J]. APPLIED PHYSICS LETTERS, 1992, 60 (26) : 3310 - 3312
  • [8] LOWER TEMPERATURE POSTANNEALING OF THIN-FILMS OF YBA2CU3O7 AT LOWER OXYGEN PARTIAL-PRESSURE
    MOGROCAMPERO, A
    TURNER, LG
    [J]. APPLIED PHYSICS LETTERS, 1991, 58 (04) : 417 - 418
  • [9] PROCESS MONITORING DURING POSTANNEALING OF YBA2CU3O7 THIN-FILMS CONTAINING FLUORINE
    MOGROCAMPERO, A
    TURNER, LG
    [J]. JOURNAL OF SUPERCONDUCTIVITY, 1992, 5 (02): : 167 - 170
  • [10] CRITICAL CURRENT-DENSITY AND MICROSTRUCTURE OF YBA2CU3O7 THIN-FILMS POSTANNEALED AT A LOW OXYGEN PARTIAL-PRESSURE
    MOGROCAMPERO, A
    TURNER, LG
    HALL, EL
    [J]. JOURNAL OF SUPERCONDUCTIVITY, 1992, 5 (02): : 143 - 147