EFFECTS OF ANNEALING ON HG0.79CD0.21 TE EPILAYERS

被引：27

作者：

CHU, M ^{[1
]}

机构：

[1] ROCKWELL INT,CTR SCI,THOUSAND OAKS,CA 91360

来源：

JOURNAL OF APPLIED PHYSICS | 1980年 / 51卷 / 11期

关键词：

D O I：

10.1063/1.327551

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

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页码：5876 / 5879

页数：4

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