PATTERN ETCHING OF CVD SI3N4-SIO2 COMPOSITES IN HF-GLYCEROL MIXTURES

被引：22

作者：

DECKERT, CA ^{[1
]}

机构：

[1] RCA LABS,PRINCETON,NJ 08540

来源：

关键词：

D O I：

10.1149/1.2129489

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2433 / 2438

页数：6

共 16 条

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[8] STUDY OF DISSOLUTION OF SIO2 IN ACIDIC FLUORIDE SOLUTIONS [J].

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[9]

KERN W, 1978, THIN FILM PROCESSES, P401

[10]

MELLIARSMITH CM, 1978, THIN FILM PROCESSES, P497