ETCHING OF CVD SI3N4 IN ACIDIC FLUORIDE MEDIA

被引：26

作者：

DECKERT, CA

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1978年 / 125卷 / 02期

关键词：

D O I：

10.1149/1.2131436

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：320 / 323

页数：4

共 10 条

[1] NONDESTRUCTIVE THICKNESS MEASUREMENT OF THIN FILMS ON MICROSTRUCTURES [J].

FRANZ, I ;

LANGHEIN.W .

SOLID-STATE ELECTRONICS, 1968, 11 (11) :987-&

[2] A SIMPLE NON-DESTRUCTIVE METHOD OF MEASURING THICKNESS OF TRANSPARENT THIN FILMS BETWEEN 10 AND 600 NM [J].

FRANZ, I ;

LANGHEINRICH, W .

SOLID-STATE ELECTRONICS, 1968, 11 (01) :59-+

[3]

Harrap V., 1973, SEMICONDUCTOR SILICO, P354

[4]

HERRING R, 1973, MAY EL SOC M CHIC

[5] INFRARED ABSORPTION SPECTRA OF AQUEOUS HF2-DF2-AND HF [J].

JONES, LH ;

PENNEMAN, RA .

JOURNAL OF CHEMICAL PHYSICS, 1954, 22 (05) :781-782

[6] STUDY OF DISSOLUTION OF SIO2 IN ACIDIC FLUORIDE SOLUTIONS [J].

JUDGE, JS .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (11) :1772-&

[7]

JUDGE JS, 1976, MAY EL SOC M WASH

[8] FLUORIDE COMPLEXES OF BERYLLIUM(2) IN AQUEOUS MEDIA [J].

MESMER, RE ;

BAES, CF .

INORGANIC CHEMISTRY, 1969, 8 (03) :618-&

[9] SPECTROPHOTOMETRIC THICKNESS MEASUREMENT FOR VERY THIN SIO2 FILMS ON SI [J].

RAND, MJ .

JOURNAL OF APPLIED PHYSICS, 1970, 41 (02) :787-&

[10] ETCHING OF SILICON NITRIDE IN PHOSPHORIC ACID WITH SILICON DIOXIDE AS A MASK [J].

VANGELDER, W ;

HAUSER, VE .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1967, 114 (08) :869-+

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