HIGH-TEMPERATURE OPERATION OF ALPHA-SILICON CARBIDE BURIED-GATE JUNCTION FIELD-EFFECT TRANSISTORS

被引:15
作者
KELNER, G
BINARI, S
SHUR, M
PALMOUR, J
机构
[1] UNIV VIRGINIA,DEPT ELECT ENGN,CHARLOTTESVILLE,VA 22903
[2] CREE RES INC,DURHAM,NC 27713
关键词
FIELD-EFFECT TRANSISTORS; SEMICONDUCTOR DEVICES AND MATERIALS; TRANSISTORS;
D O I
10.1049/el:19910646
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The high temperature operation of alpha-SiC buried-gate junction field-effect transistors is reported. Devices fabricated with a 4-mu-m gate length have a maximum transconductance of 17 mS/mm and a maximum drain saturation current of 450 mA/mm at room temperature. The devices are completely pinched off at a gate voltage of -40 V. Devices with a gate length of 39-mu-m have a transconductance of 5.4 mS/mm at room temperature which decreases to 1.7 mS/mm at 400-degrees-C. This decrease in transconductance is due to the reduction of mobility with increasing temperature. The values of transconductances at room temperature and at elevated temperatures are the highest reported for alpha-SiC JFETs.
引用
收藏
页码:1038 / 1040
页数:3
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