INFRARED-LASER INTERFEROMETRIC THERMOMETRY - A NONINTRUSIVE TECHNIQUE FOR MEASURING SEMICONDUCTOR WAFER TEMPERATURES

被引：92

作者：

DONNELLY, VM

MCCAULLEY, JA

机构：

[1] AT&T Bell Laboratories, Murray Hill, New Jersey

[2] Current address: Robert L. Mitchell Technical Center, Hoechst Celanese Corp., Summit

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1990年 / 8卷 / 01期

关键词：

D O I：

10.1116/1.576993

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

[No abstract available]

引用

收藏

页码：84 / 92

页数：9

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