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COMPLETE BASE PROFILE SHAPE IN A PUSHED-OUT DIFFUSED TRANSISTOR ANALYZED BY RADIOTRACER METHODS
被引:9
作者
:
JONES, CL
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV SOUTHAMPTON ENGN MAT LABS, SOUTHAMPTON, ENGLAND
UNIV SOUTHAMPTON ENGN MAT LABS, SOUTHAMPTON, ENGLAND
JONES, CL
[
1
]
WILLOUGHBY, AF
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV SOUTHAMPTON ENGN MAT LABS, SOUTHAMPTON, ENGLAND
UNIV SOUTHAMPTON ENGN MAT LABS, SOUTHAMPTON, ENGLAND
WILLOUGHBY, AF
[
1
]
机构
:
[1]
UNIV SOUTHAMPTON ENGN MAT LABS, SOUTHAMPTON, ENGLAND
来源
:
APPLIED PHYSICS LETTERS
|
1974年
/ 25卷
/ 02期
关键词
:
D O I
:
10.1063/1.1655401
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:114 / 116
页数:3
相关论文
共 7 条
[1]
BLANCHARD B, 1972, COMPTES RENDUS COLLO
[2]
ALTERNATIVE RELATIONSHIP FOR CONVERTING INCREMENTAL SHEET RESISTIVITY MEASUREMENTS INTO PROFILES OF IMPURITY CONCENTRATION
EVANS, RA
论文数:
0
引用数:
0
h-index:
0
EVANS, RA
DONOVAN, RP
论文数:
0
引用数:
0
h-index:
0
DONOVAN, RP
[J].
SOLID-STATE ELECTRONICS,
1967,
10
(02)
: 155
-
&
[3]
INTERACTIONS IN SEQUENTIAL DIFFUSION PROCESSES IN SEMICONDUCTORS
HU, SM
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Components Division, East Fishkill Facility, Hopewell Junction, NY
HU, SM
SCHMIDT, S
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Components Division, East Fishkill Facility, Hopewell Junction, NY
SCHMIDT, S
[J].
JOURNAL OF APPLIED PHYSICS,
1968,
39
(09)
: 4272
-
+
[4]
HU SM, 1973, ATOMIC DIFFUSION SEM
[5]
RESISTIVITY OF BULK SILICON AND OF DIFFUSED LAYERS IN SILICON
IRVIN, JC
论文数:
0
引用数:
0
h-index:
0
IRVIN, JC
[J].
BELL SYSTEM TECHNICAL JOURNAL,
1962,
41
(02):
: 387
-
+
[6]
Anomalous Diffusion Effects in Silicon (A Review)
Willoughby, A. F. W.
论文数:
0
引用数:
0
h-index:
0
机构:
Univ Southampton, Engn Mat Labs, Southampton, Hants, England
Univ Southampton, Engn Mat Labs, Southampton, Hants, England
Willoughby, A. F. W.
[J].
JOURNAL OF MATERIALS SCIENCE,
1968,
3
(01)
: 89
-
98
[7]
DISCOVERY OF ANOMALOUS BASE REGIONS IN TRANSISTORS
ZIEGLER, JF
论文数:
0
引用数:
0
h-index:
0
ZIEGLER, JF
BAGLIN, JEE
论文数:
0
引用数:
0
h-index:
0
BAGLIN, JEE
COLE, GW
论文数:
0
引用数:
0
h-index:
0
COLE, GW
[J].
APPLIED PHYSICS LETTERS,
1972,
21
(04)
: 177
-
&
←
1
→
共 7 条
[1]
BLANCHARD B, 1972, COMPTES RENDUS COLLO
[2]
ALTERNATIVE RELATIONSHIP FOR CONVERTING INCREMENTAL SHEET RESISTIVITY MEASUREMENTS INTO PROFILES OF IMPURITY CONCENTRATION
EVANS, RA
论文数:
0
引用数:
0
h-index:
0
EVANS, RA
DONOVAN, RP
论文数:
0
引用数:
0
h-index:
0
DONOVAN, RP
[J].
SOLID-STATE ELECTRONICS,
1967,
10
(02)
: 155
-
&
[3]
INTERACTIONS IN SEQUENTIAL DIFFUSION PROCESSES IN SEMICONDUCTORS
HU, SM
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Components Division, East Fishkill Facility, Hopewell Junction, NY
HU, SM
SCHMIDT, S
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Components Division, East Fishkill Facility, Hopewell Junction, NY
SCHMIDT, S
[J].
JOURNAL OF APPLIED PHYSICS,
1968,
39
(09)
: 4272
-
+
[4]
HU SM, 1973, ATOMIC DIFFUSION SEM
[5]
RESISTIVITY OF BULK SILICON AND OF DIFFUSED LAYERS IN SILICON
IRVIN, JC
论文数:
0
引用数:
0
h-index:
0
IRVIN, JC
[J].
BELL SYSTEM TECHNICAL JOURNAL,
1962,
41
(02):
: 387
-
+
[6]
Anomalous Diffusion Effects in Silicon (A Review)
Willoughby, A. F. W.
论文数:
0
引用数:
0
h-index:
0
机构:
Univ Southampton, Engn Mat Labs, Southampton, Hants, England
Univ Southampton, Engn Mat Labs, Southampton, Hants, England
Willoughby, A. F. W.
[J].
JOURNAL OF MATERIALS SCIENCE,
1968,
3
(01)
: 89
-
98
[7]
DISCOVERY OF ANOMALOUS BASE REGIONS IN TRANSISTORS
ZIEGLER, JF
论文数:
0
引用数:
0
h-index:
0
ZIEGLER, JF
BAGLIN, JEE
论文数:
0
引用数:
0
h-index:
0
BAGLIN, JEE
COLE, GW
论文数:
0
引用数:
0
h-index:
0
COLE, GW
[J].
APPLIED PHYSICS LETTERS,
1972,
21
(04)
: 177
-
&
←
1
→