LOW-TEMPERATURE FORMATION OF POLYCRYSTALLINE SILICON FILMS BY MOLECULAR-BEAM DEPOSITION

被引：33

作者：

MATSUI, M

SHIRAKI, Y

MARUYAMA, E

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1982年 / 53卷 / 02期

关键词：

D O I：

10.1063/1.330580

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：995 / 998

页数：4

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