PLASMA-EMISSION-CONTROLLED DC MAGNETRON SPUTTERING OF TIO2-X THIN-FILMS

被引：54

作者：

BRUDNIK, A ^{[1
]}

CZTERNASTEK, H ^{[1
]}

ZAKRZEWSKA, K ^{[1
]}

JACHIMOWSKI, M ^{[1
]}

机构：

[1] HIGH PEDAG SCH CRACOW,INST PHYS,KRAKOW,POLAND

来源：

THIN SOLID FILMS | 1991年 / 199卷 / 01期

关键词：

D O I：

10.1016/0040-6090(91)90051-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A simple, low cost plasma-emission-controlled system was designed and built in our laboratory. The system was applied to d.c. reactive magnetron sputtering of TiO2-x films. The film properties such as composition, electrical resistivity, refractive index and absorption coefficient were studied in relation to the reference voltage being a controllable system parameter. It was found that there existed a correlation between the reference voltage which was a measure of the intensity of the titanium emission line and the film composition. The changes in the electrical and optical parameters of TiO2-x films with the reference voltage could be accounted for by the variation in the departure x from stoichiometry.

引用

页码：45 / 58

页数：14

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