HOLLOW-CATHODE PLASMA ASSISTED CHEMICAL VAPOR-DEPOSITION OF DIAMOND

被引：46

作者：

SINGH, B

MESKER, OR

LEVINE, AW

ARIE, Y

机构：

来源：

APPLIED PHYSICS LETTERS | 1988年 / 52卷 / 20期

关键词：

D O I：

10.1063/1.99049

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：1658 / 1660

页数：3

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