DEPOSITION RATE DISTRIBUTION IN A ROTATABLE CYLINDRICAL CATHODE SYSTEM

被引：13

作者：

BELKIND, A

GERRISTEAD, W

ORBAN, Z

机构：

[1] BOC Group Inc, Murray Hill, United States

来源：

THIN SOLID FILMS | 1992年 / 207卷 / 1-2期

关键词：

Cathodes - Sputtering - Titanium Oxides - Zirconia;

D O I：

10.1016/0040-6090(92)90144-Z

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The deposition rate distribution was calculated for a rotatable cylindrical magnetron (C-Mag(TM) magnetron) assuming a cosine law for emitted particles. The calculations were compared with the deposition rate distribution obtained using sputtering and co-sputtering of Al2O3, TiO2, and ZrO2.

引用

页码：319 / 323

页数：5

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