RESOLUTION, OVERLAY, AND FIELD SIZE FOR LITHOGRAPHY SYSTEMS

[1] EXPERIMENTELLE BESTIMMUNG DER ENERGIEVERTEILUNG IN THERMISCH AUSGELOSTEN ELEKTRONENSTRAHLEN [J]. ZEITSCHRIFT FUR PHYSIK, 1954, 139 (02): : 115 - 146

[2] ELECTRON-BEAM PROXIMITY PRINTING - MASK LIFE INVESTIGATIONS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1834 - 1837

[3] BOWDEN MJ, 1979, SOLID STATE TECHNOL, V22, P72

[4] ELECTRON-BEAM FABRICATION OF 80-A METAL STRUCTURES [J]. APPLIED PHYSICS LETTERS, 1976, 29 (09) : 596 - 598

[5] RESOLUTION LIMITS OF PMMA RESIST FOR EXPOSURE WITH 50 KV ELECTRONS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (01) : 166 - 170

[6] BROERS AN, 1972, 5TH P INT C EL ION B, P3

[7] BROERS AN, 1980, 9TH P INT C EL ION B, P396

[8] BROERS AN, 1978, 9TH P INT C EL MICR, V3, P343

[9] CAHEN O, 1972, 4TH P INT C EL ION B, P92

[10] CHANG THP, 1976, 7TH P INT C EL ION B, P377

[1] EXPERIMENTELLE BESTIMMUNG DER ENERGIEVERTEILUNG IN THERMISCH AUSGELOSTEN ELEKTRONENSTRAHLEN [J]. ZEITSCHRIFT FUR PHYSIK, 1954, 139 (02): : 115 - 146

[2] ELECTRON-BEAM PROXIMITY PRINTING - MASK LIFE INVESTIGATIONS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1834 - 1837

[3] BOWDEN MJ, 1979, SOLID STATE TECHNOL, V22, P72

[4] ELECTRON-BEAM FABRICATION OF 80-A METAL STRUCTURES [J]. APPLIED PHYSICS LETTERS, 1976, 29 (09) : 596 - 598

[5] RESOLUTION LIMITS OF PMMA RESIST FOR EXPOSURE WITH 50 KV ELECTRONS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (01) : 166 - 170

[6] BROERS AN, 1972, 5TH P INT C EL ION B, P3

[7] BROERS AN, 1980, 9TH P INT C EL ION B, P396

[8] BROERS AN, 1978, 9TH P INT C EL MICR, V3, P343

[9] CAHEN O, 1972, 4TH P INT C EL ION B, P92

[10] CHANG THP, 1976, 7TH P INT C EL ION B, P377