METALLIZATION OF CERAMICS FOR ELECTRONIC COMPONENTS BY MAGNETRON-PLASMATRON COATING

被引：2

作者：

SCHILLER, S

HEISIG, U

STEINFELDER, K

MEHR, D

THUSS, B

PETERMANN, R

机构：

[1] VEB ELEKTR,GERA,GER DEM REP

[2] VEB KERAM WERKE,HERMSDORF,GER DEM REP

来源：

THIN SOLID FILMS | 1980年 / 72卷 / 02期

关键词：

D O I：

10.1016/0040-6090(80)90013-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：313 / 326

页数：14

共 10 条

[1]

Fraser D. B., 1978, THIN FILM PROCESSES

[2] ADVANCES IN HIGH-RATE SPUTTERING WITH MAGNETRON-PLASMATRON PROCESSING AND INSTRUMENTATION [J].

SCHILLER, S ;

HEISIG, U ;

GOEDICKE, K ;

SCHADE, K ;

TESCHNER, G ;

HENNEBERGER, J .

THIN SOLID FILMS, 1979, 64 (03) :455-467

[3] ROLE OF PLASMATRON-MAGNETRON SYSTEMS IN PHYSICAL VAPOR-DEPOSITION TECHNIQUES [J].

SCHILLER, S ;

HEISIG, U ;

GOEDICKE, K .

THIN SOLID FILMS, 1978, 54 (01) :33-47

[4] USE OF RING GAP PLASMATRON FOR HIGH-RATE SPUTTERING [J].

SCHILLER, S ;

HEISIG, U ;

GOEDICKE, K .

THIN SOLID FILMS, 1977, 40 (JAN) :327-334

[5] REACTIVE DC SPUTTERING WITH THE MAGNETRON-PLASMATRON FOR TANTALUM PENTOXIDE AND TITANIUM-DIOXIDE FILMS [J].

SCHILLER, S ;

HEISIG, U ;

STEINFELDER, K ;

STRUMPFEL, J .

THIN SOLID FILMS, 1979, 63 (02) :369-375

[6]

SCHILLER S, 1978, VAKUUM-TECH, V27, P51

[7]

SCHILLER S, 1978, VAKUUM-TECH, V27, P75

[8]

SCHILLER S, 1977, 7TH P INT VAC C 3RD, V2, P1545

[9]

Waits R.K., 1978, THIN FILM PROCESSES, p[24, 131]

[10]

1976, PHYSICAL VAPOUR DEPO

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