ROLE OF PLASMATRON-MAGNETRON SYSTEMS IN PHYSICAL VAPOR-DEPOSITION TECHNIQUES

The use of magnetic-field-enhanced gas discharges in ring gap systems has brought a new situation to the field of vacuum coating. Equipment of this type is known under such terms as magnetron, plasmatron etc. On the basis of the known technical and scientific levels, the most important features of this discharge system are compiled and compared with those of other deposition sources. At this time the main field of application is high rate d.c. sputtering. Owing to the properties of this system, it will gain in importance also for ion-aided coating processes. We discuss some system solutions, considering the performance inherent in this type of particle source. © 1978.