ROLE OF PLASMATRON-MAGNETRON SYSTEMS IN PHYSICAL VAPOR-DEPOSITION TECHNIQUES

被引：30

作者：

SCHILLER, S

HEISIG, U

GOEDICKE, K

机构：

[1] Forschungsinstitut Manfred von Ardenne, 8051 Dresden

来源：

THIN SOLID FILMS | 1978年 / 54卷 / 01期

关键词：

D O I：

10.1016/0040-6090(78)90274-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The use of magnetic-field-enhanced gas discharges in ring gap systems has brought a new situation to the field of vacuum coating. Equipment of this type is known under such terms as magnetron, plasmatron etc. On the basis of the known technical and scientific levels, the most important features of this discharge system are compiled and compared with those of other deposition sources. At this time the main field of application is high rate d.c. sputtering. Owing to the properties of this system, it will gain in importance also for ion-aided coating processes. We discuss some system solutions, considering the performance inherent in this type of particle source. © 1978.

引用

页码：33 / 47

页数：15

共 53 条

[41] NIFE FILMS DEPOSITED BY SPUTTER GUN AND APPLICATIONS TO BUBBLE-DEVICES [J].

TAO, LJ ;

AHN, KY ;

LIN, BJ ;

MOLZEN, WW .

THIN SOLID FILMS, 1976, 37 (03) :423-427

[42] TUBULAR HOLLOW-CATHODE SPUTTERING ONTO SUBSTRATES OF COMPLEX SHAPE [J].

THORNTON, JA ;

HEDGCOTH, VL .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (01) :93-97

[43]

TSUKADA T, 1977, 7TH P INT VAC C, P1591

[44]

TSUKADA T, 1977, 3RD INT C SOL SURF V, P1591

[45]

UNTERKOFLER GI, 1976, APR INT C MET COAT S

[46]

URBANEK K, 1977, SOLID STATE TECHNOL, V20, P87

[47]

VANVOROUS T, 1976, SOLID STATE TECHNOL, V19, P62

[48]

WEHNER GK, 1964, FESTKORPERZERSTAUBUN, V25

[49]

WELSCH R, 1978, STAND PERSPEKTIVEN K, V6

[50] APPLICATION OF HIGH-RATE EXB OR MAGNETRON SPUTTERING IN METALLIZATION OF SEMICONDUCTOR-DEVICES [J].

WILSON, RW ;

TERRY, LE .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (01) :157-164

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