SPUTTERING YIELDS OF NICKEL AND CHROMIUM

被引：8

作者：

CHEN, GP

VONSEGGERN, J

GNASER, H

HOFER, WO

机构：

[1] FORSCHUNGSZENTRUM JULICH, INST GRENZFLACHENFORSCH & VAKUUMPHYS, D-5170 JULICH 1, FED REP GER

[2] UNIV KAISERSLAUTERN, FACHBEREICH PHYS, D-6750 KAISERSLAUTERN, FED REP GER

[3] FORSCHUNGSZENTRUM JULICH, PROJEKT KERNFUS, D-5170 JULICH 1, FED REP GER

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1989年 / 49卷 / 06期

关键词：

D O I：

10.1007/BF00616998

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：711 / 717

页数：7

共 27 条

[1] DEPENDENCE OF LIGHT-ION SPUTTERING YIELDS OF IRON ON ION FLUENCE AND OXYGEN PARTIAL-PRESSURE
BEHRISCH, R
ROTH, J
BOHDANSKY, J
MARTINELLI, AP
SCHWEER, B
RUSBULDT, D
HINTZ, E
[J]. JOURNAL OF NUCLEAR MATERIALS, 1980, 93-4 (OCT) : 645 - 655
[2] BEHRISCH R, 1989, TOPICS APPLIED PHYSI, V3
[3] BEHRISCH R, 1981, TOPICS APPLIED PHYSI, V1
[4] BEHRISCH R, 1983, TOPICS APPLIED PHYSI, V2
[5] CANTAGREL M, 1973, J MATER SCI, V8, P1711, DOI 10.1007/BF02403521
[6] DANTANIELLO A, 1989, J NUCL MATER, V162, P951
[7] LASER FLUORESCENCE MEASUREMENTS OF THE FLUX-DENSITY OF TITANIUM SPUTTERED FROM AN OXYGEN COVERED SURFACE
DULLNI, E
[J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1985, 38 (02): : 131 - 138
[8] ANALYSIS OF SOLIDS BY SECONDARY ION AND SPUTTERED NEUTRAL MASS-SPECTROMETRY
GNASER, H
FLEISCHHAUER, J
HOFER, WO
[J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1985, 37 (04): : 211 - 220
[9] SPUTTER-EROSION AND IMPURITY EMISSION FROM TITANIUM AND VANADIUM AT LOW-ENERGY ION-BOMBARDMENT
HOFER, WO
BAY, HL
MARTIN, PJ
[J]. JOURNAL OF NUCLEAR MATERIALS, 1978, 76-7 (1-2) : 156 - 162
[10] INFLUENCE OF REACTIVE GASES ON SPUTTERING AND SECONDARY ION EMISSION - OXIDATION OF TITANIUM AND VANADIUM DURING ENERGETIC PARTICLE IRRADIATION
HOFER, WO
MARTIN, PJ
[J]. APPLIED PHYSICS, 1978, 16 (03): : 271 - 278