ION-BEAM SPUTTERING DEPOSITION OF FLUOROPOLYMER THIN-FILMS

被引:61
作者
QUARANTA, F
VALENTINI, A
FAVIA, P
LAMENDOLA, R
DAGOSTINO, R
机构
[1] UNIV BARI,DIPARTIMENTO CHIM,I-70126 BARI,ITALY
[2] CNR,CTR STUDIO CHIM PLASMI,I-70126 BARI,ITALY
关键词
D O I
10.1063/1.109729
中图分类号
O59 [应用物理学];
学科分类号
摘要
It is shown that it is possible to deposit thin films with various CF(x) composition (1.26 less-than-or-equal-to x less-than-or-equal-to 1.83) by ion-beam sputtering. These materials with ''teflon-like'' composition have been deposited at room temperature by Ar ion-beam sputtering of a teflon target; the film chemical composition has been determined by electron spectroscopy for chemical analysis. The fluorine-to-carbon ratio of the films, as well as their crosslinking degree, is shown to depend on the energy of the ions impinging on the target.
引用
收藏
页码:10 / 11
页数:2
相关论文
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