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- [2] DAGOSTINO R, 1990, PLASMA DEPOSITION TR, P95
- [3] TECHNOLOGY AND APPLICATIONS OF BROAD-BEAM ION SOURCES USED IN SPUTTERING .2. APPLICATIONS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (03): : 737 - 756
- [4] MOULDER JF, 1992, HDB XRAY PHOTOELECTR, P47
- [5] QUARANTA F, 1993, J APPL PHYS, V73
- [6] DUAL-ION-BEAM SPUTTER DEPOSITION OF TIN FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1991, 69 (10) : 7360 - 7362
- [7] [No title captured]