IMPURITY ATOM DISTRIBUTION RESULTING FROM THERMAL REDISTRIBUTION OF AN IMPLANTED IMPURITY SOURCE

被引:3
作者
PERLOFF, DS [1 ]
机构
[1] SIGNETICS CORP,RES & DEV LAB,SUNNYVALE,CA 94086
关键词
D O I
10.1149/1.2403647
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
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页码:1135 / 1138
页数:4
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