A CONTROLLED RADIATION SOURCE AND ELECTRON X-RAY FLUX RATIOS IN AN ELECTRON-BEAM METAL EVAPORATOR

被引：31

作者：

BHATTACHARYA, PK

REISMAN, A

CHEN, MC

机构：

[1] BHABHA ATOM RES CTR,BOMBAY 400085,INDIA

[2] N CAROLINA STATE UNIV,DEPT ELECT ENGN,RALEIGH,NC 27695

[3] NATL CHIAO TUNG UNIV,HSINCHU,TAIWAN

来源：

JOURNAL OF ELECTRONIC MATERIALS | 1988年 / 17卷 / 04期

关键词：

D O I：

10.1007/BF02652106

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：273 / 283

页数：11

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