OPTICAL-PROPERTIES OF SI-SI1-XGEX AND SI-GE NANOSTRUCTURES

被引:10
作者
TANG, YS
TORRES, CMS
WHALL, TE
PARKER, EHC
PRESTING, H
KIBBEL, H
机构
[1] UNIV WARWICK,DEPT PHYS,COVENTRY CV4 7AL,W MIDLANDS,ENGLAND
[2] DAIMLER BENZ AG,RES CTR,W-7900 ULM,GERMANY
关键词
D O I
10.1007/BF00125892
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper reviews the current research status on the optical properties of Si-Si1-xGex and Si-Ge nanostructures. Although this is a relatively new field, existing research has already achieved promising results in terms of both physics and possible device applications including the effect of process-induced strain in nanostructures, quantum confinement and improved optical efficiency of collective excitation in wires with reduced dimension, and especially the huge improvement of optical efficiency in quantum dots after nanofabrication. These results potentially open a new field of research into both the physics of Si-Si1-xGex nanostructures and the possible applications of them in cheap Si based optoelectronic industry.
引用
收藏
页码:356 / 362
页数:7
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