STRESS GENERATED IN POLYIMIDE BY EXCIMER-LASER IRRADIATION

被引:64
作者
ZWEIG, AD [1 ]
VENUGOPALAN, V [1 ]
DEUTSCH, TF [1 ]
机构
[1] MASSACHUSETTS GEN HOSP, WELLMAN LABS PHOTOMED, BOSTON, MA 02114 USA
关键词
D O I
10.1063/1.354422
中图分类号
O59 [应用物理学];
学科分类号
摘要
Stress transients are generated in polyimide by irradiation with excimer-laser pulses at radiant exposures between 3 X 10(-3) and 10(2) J/cm2 . The duration and peak stress of these transients are measured using piezoelectric film transducers. For all the wavelengths tested (193, 248, 308, 351 nm) we determine three ranges of radiant exposure within which different physical mechanisms govern the stress generation. The scaling of stress with radiant exposure depends on wavelength only in the low fluence regime. In this regime the stresses observed are attributed to subsurface thermal decomposition at 351 and 308 nm and to photodecomposition at 248 and 193 nm. At higher radiant exposure the stress generation is governed either by the thermal expansion of the gaseous ablation products or by the formation and expansion of a dense plasma. The boundary between these two regimes is identified from the variation of the mechanical coupling coefficient with radiant exposure. The results also indicate that heat conduction contributes significantly to the coupling of energy into the target, leading to a reduction in the stresses generated and to an increase in etch depth when ablation is achieved.
引用
收藏
页码:4181 / 4189
页数:9
相关论文
共 39 条
[1]   DIRECT ETCHING OF POLYMERIC MATERIALS USING A XECL LASER [J].
ANDREW, JE ;
DYER, PE ;
FORSTER, D ;
KEY, PH .
APPLIED PHYSICS LETTERS, 1983, 43 (08) :717-719
[2]   EXCIMER LASER-INDUCED ABLATION OF POLYETHERETHERKETONE, POLYIMIDE, AND POLYTETRAFLUOROETHYLENE [J].
BABU, SV ;
DCOUTO, GC ;
EGITTO, FD .
JOURNAL OF APPLIED PHYSICS, 1992, 72 (02) :692-698
[3]   EXCIMER LASER ETCHING OF POLYIMIDE [J].
BRANNON, JH ;
LANKARD, JR ;
BAISE, AI ;
BURNS, F ;
KAUFMAN, J .
JOURNAL OF APPLIED PHYSICS, 1985, 58 (05) :2036-2043
[4]   THERMOELASTIC STRESS PRODUCTION IN SOLIDS [J].
BUSHNELL, JC ;
MCCLOSKEY, DJ .
JOURNAL OF APPLIED PHYSICS, 1968, 39 (12) :5541-+
[5]   ON SINGLE-PHOTON ULTRAVIOLET ABLATION OF POLYMERIC MATERIALS [J].
CAIN, SR ;
BURNS, FC ;
OTIS, CE .
JOURNAL OF APPLIED PHYSICS, 1992, 71 (09) :4107-4117
[6]   ABLATIVE AND ACOUSTIC RESPONSE OF PULSED UV LASER-IRRADIATED VASCULAR TISSUE IN A LIQUID ENVIRONMENT [J].
CROSS, FW ;
ALDHAHIR, RK ;
DYER, PE .
JOURNAL OF APPLIED PHYSICS, 1988, 64 (04) :2194-2201
[7]   SPECTROSCOPIC STUDIES OF ARF LASER PHOTOABLATION OF PMMA [J].
DAVIS, GM ;
GOWER, MC ;
FOTAKIS, C ;
EFTHIMIOPOULOS, T ;
ARGYRAKIS, P .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1985, 36 (01) :27-30
[8]  
DEHM EJ, 1986, ARCH OPHTHALMOL-CHIC, V104, P1364
[9]   SELF-DEVELOPING UV PHOTORESIST USING EXCIMER LASER EXPOSURE [J].
DEUTSCH, TF ;
GEIS, MW .
JOURNAL OF APPLIED PHYSICS, 1983, 54 (12) :7201-7204
[10]  
DINGUS RS, 1991, P SOC PHOTO-OPT INS, V1427, P45, DOI 10.1117/12.44088