DEPTH PROFILING OF HELIUM IN NI AND NB - COMPARISON OF DIFFERENT METHODS

被引：40

作者：

SCHERZER, BMU

BAY, HL

BEHRISCH, R

BORGESEN, P

ROTH, J

机构：

来源：

NUCLEAR INSTRUMENTS & METHODS | 1978年 / 157卷 / 01期

关键词：

D O I：

10.1016/0029-554X(78)90590-6

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

收藏

页码：75 / 81

页数：7

相关论文

共 46 条

[1] DEPTH PROFILING OF DEUTERIUM IMPLANTED INTO STAINLESS-STEEL AT ROOM-TEMPERATURE
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[4] IMPLANTATION PROFILES OF LOW-ENERGY HELIUM IN NIOBIUM AND BLISTERING MECHANISM
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[6] BIERSACK JP, 1977, 1976 P INT S PLASM W, P421
[7] DEPTH DISTRIBUTION OF IMPLANTED HELIUM AND OTHER LOW-Z ELEMENTS IN METAL-FILMS USING PROTON BACKSCATTERING
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[J]. APPLIED PHYSICS LETTERS, 1973, 23 (11) : 593 - 595
[8] BLEWER RS, 1976, ADV CHEM SERIES, P262
[9] BOTTIGER J, UNPUBLISHED
[10] PRINCIPLES AND APPLICATIONS OF ION-BEAM TECHNIQUES FOR ANALYSIS OF SOLIDS AND THIN-FILMS
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[J]. THIN SOLID FILMS, 1973, 17 (01) : 1 - 41

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