MINORITY-CARRIER TRANSPORT IN CARBON DOPED GALLIUM-ARSENIDE

被引:15
作者
COLOMB, CM
STOCKMAN, SA
VARADARAJAN, S
STILLMAN, GE
机构
[1] Center for Compound Semiconductor Microelectronics, University of Illinois, Urbana-Champaign
关键词
D O I
10.1063/1.107375
中图分类号
O59 [应用物理学];
学科分类号
摘要
Minority carrier electron mobilities and diffusion lengths in p-type C-doped GaAs have been measured at room temperature and 77 K using the zero field time of flight (ZFTOF) technique on p+-n structures with p+ carrier concentrations of 1.1 x 10(19), 6.0 X 10(18), 1.8 X 10(18) cm-3, which were grown by low-pressure metalorganic chemical vapor deposition (MOCVD) using CCl4 as the dopant. The electron mobilities obtained are higher than those reported for Be-doped MBE GaAs but lower than those reported for Ge-doped, LPE GaAs, while the diffusion lengths are similar to those found in similar concentration Be-doped samples.
引用
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页码:65 / 67
页数:3
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