THE ENERGY-DEPENDENCE OF ATTENUATION LENGTHS IN ELEMENTS

被引：15

作者：

EBEL, H ^{[1
]}

EBEL, MF ^{[1
]}

BALDAUF, P ^{[1
]}

JABLONSKI, A ^{[1
]}

机构：

[1] POLISH ACAD SCI,INST PHYS CHEM,WARSAW 42,POLAND

来源：

SURFACE AND INTERFACE ANALYSIS | 1988年 / 12卷 / 1-12期

关键词：

D O I：

10.1002/sia.740120226

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Electrons

引用

页码：172 / 173

页数：2

共 22 条

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[5] THE INELASTIC MEAN FREE PATHS OF AUGER ELECTRONS IN THIN-FILMS OF COPPER AND NICKEL
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[6] ELECTRON MEAN ESCAPE DEPTHS FROM X-RAY PHOTOELECTRON-SPECTRA OF THERMALLY OXIDIZED SILICON DIOXIDE FILMS ON SILICON
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[J]. SURFACE SCIENCE, 1981, 105 (01) : 217 - 224
[8] Hedman J., 1972, PHYS SCRIPTA, V5, P93, DOI [10.1088/0031-8949/5/1-2/015, DOI 10.1088/0031-8949/5/1-2/015]
[9] JABLONSKI A, IN PRESS SURF SCI
[10] ELECTRON ESCAPE DEPTH IN SILICON
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