INFLUENCE OF DOPING ON THE ETCHING OF SI(111)

[1] BAGUS PS, 1985, MATERIALS RES SOC S, V38, P179

[2] EFFECTS OF DOPING ON POLYSILICON ETCH RATE IN A FLUORINE-CONTAINING PLASMA [J]. JOURNAL OF APPLIED PHYSICS, 1985, 57 (06) : 2221 - 2225

[3] EVIDENCE FOR FREE CARRIER DEPENDENCE OF POLYSILICON ETCH RATE IN A FLUORINE-BASED PLASMA [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (10) : 2202 - 2204

[4] BERZ F, 1975, SURFACE PHYSICS PHOS, P152

[5] Cabrera N., 1949, REP PROG PHYS, V12, P308

[6] INFRARED-LASER RADIATION EFFECTS ON XEF2 INTERACTION WITH SILICON [J]. JOURNAL OF CHEMICAL PHYSICS, 1981, 74 (02) : 1461 - 1466

[7] THE ROLE OF ENERGETIC ION-BOMBARDMENT IN SILICON-FLUORINE CHEMISTRY [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1987, 27 (01) : 243 - 248

[8] PLASMA-ASSISTED ETCHING - ION-ASSISTED SURFACE-CHEMISTRY [J]. APPLICATIONS OF SURFACE SCIENCE, 1985, 22-3 (MAY): : 63 - 71

[9] Fehner F. P., 1970, J OXIDATION METALS, V2, P59

[10] Flamm D.L., 1981, PLASMA CHEM PLASMA P, V1, P317, DOI [10.1007/bf00565992, DOI 10.1007/BF00565992]

[1] BAGUS PS, 1985, MATERIALS RES SOC S, V38, P179

[2] EFFECTS OF DOPING ON POLYSILICON ETCH RATE IN A FLUORINE-CONTAINING PLASMA [J]. JOURNAL OF APPLIED PHYSICS, 1985, 57 (06) : 2221 - 2225

[3] EVIDENCE FOR FREE CARRIER DEPENDENCE OF POLYSILICON ETCH RATE IN A FLUORINE-BASED PLASMA [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (10) : 2202 - 2204

[4] BERZ F, 1975, SURFACE PHYSICS PHOS, P152

[5] Cabrera N., 1949, REP PROG PHYS, V12, P308

[6] INFRARED-LASER RADIATION EFFECTS ON XEF2 INTERACTION WITH SILICON [J]. JOURNAL OF CHEMICAL PHYSICS, 1981, 74 (02) : 1461 - 1466

[7] THE ROLE OF ENERGETIC ION-BOMBARDMENT IN SILICON-FLUORINE CHEMISTRY [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1987, 27 (01) : 243 - 248

[8] PLASMA-ASSISTED ETCHING - ION-ASSISTED SURFACE-CHEMISTRY [J]. APPLICATIONS OF SURFACE SCIENCE, 1985, 22-3 (MAY): : 63 - 71

[9] Fehner F. P., 1970, J OXIDATION METALS, V2, P59

[10] Flamm D.L., 1981, PLASMA CHEM PLASMA P, V1, P317, DOI [10.1007/bf00565992, DOI 10.1007/BF00565992]