A SIMPLE METHOD OF DEPOSITING OXYGEN-FREE TITANIUM SILICIDE FILMS USING VACUUM EVAPORATION

被引：4

作者：

AHMAD, S

PACHAURI, JP

AKHTAR, J

机构：

来源：

THIN SOLID FILMS | 1986年 / 143卷 / 02期

关键词：

D O I：

10.1016/0040-6090(86)90383-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：155 / 162

页数：8

共 12 条

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