FORMATION AND PROPERTIES OF TISI2 FILMS

被引：40

作者：

GULDAN, A ^{[1
]}

SCHILLER, V ^{[1
]}

STEFFEN, A ^{[1
]}

BALK, P ^{[1
]}

机构：

[1] AACHEN TECH UNIV,INST SEMICOND ELECTR,SONDERFORSCH BEREICH FESTKORPERELECTR 56,AACHEN,FED REP GER

来源：

关键词：

D O I：

10.1016/0040-6090(83)90223-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：1 / 7

页数：7

共 7 条

[1] MOHAMMADI F, 1981, SOLID STATE TECHNOL, V24, P65
[2] THIN-FILM INTERACTION BETWEEN TITANIUM AND POLYCRYSTALLINE SILICON
MURARKA, SP
FRASER, DB
[J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (01) : 342 - 349
[3] SILICIDE FORMATION IN THIN CO-SPUTTERED (TITANIUM + SILICON) FILMS ON POLYCRYSTALLINE SILICON AND SIO2
MURARKA, SP
FRASER, DB
[J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (01) : 350 - 356
[4] MURARKA SP, 1981, 4TH P INT S SIL MAT, P551
[5] REVIEW OF BINARY ALLOY FORMATION BY THIN-FILM INTERACTIONS
OTTAVIANI, G
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (05): : 1112 - 1119
[6] PINIZOTTO RF, 1981, 4TH P INT S SIL MAT, P562
[7] 1981, GMELIN HDB ANORGANIS