INXGA1-XAS GAAS PSEUDOMORPHIC QUANTUM-WELLS - GROWTH AND THERMAL-STABILITY

被引:12
作者
NICKEL, H [1 ]
LOSCH, R [1 ]
SCHLAPP, W [1 ]
LEIER, H [1 ]
FORCHEL, A [1 ]
机构
[1] UNIV STUTTGART,INST PHYS 4,W-7000 STUTTGART 80,GERMANY
关键词
D O I
10.1016/0039-6028(90)90323-Z
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We have optimized the MBE growth conditions of InGaAs/GaAs pseudomorphic structures in order to obtain narrow emission linewidths and high quantum efficiencies. The thermal stability of the strained layers is studied using annealing at T≤930 °C. From the evaluation of the luminescence spectra after 30 min annealing we estimate an In/Ga interdiffusion length of about 2 nm at 900° C. © 1990.
引用
收藏
页码:340 / 343
页数:4
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