INVESTIGATION OF RF-SPUTTERED ND-GLASS FILMS FOR INTEGRATED-OPTICS

The rf sputtering of Nd-glass films from targets containing low dissociation energy oxides has been investigated, and factors affecting optical quality and process time are discussed. These include gas composition and pressure, input power density, substrate temperature, annealing, surface damage, and thermal properties of both host glass and substrate. Several methods for overcoming anion depletion in the films and reducing waveguide losses are evaluated.