EUROPEAN MAGNETIC MATERIALS AND APPLICATIONS
|
2001年
/
373-3卷
关键词:
electrodeposition;
magnetic field;
multilayers;
high moment alloys;
D O I:
10.4028/www.scientific.net/MSF.373-376.1
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
The area of magnetic electrochemistry is reviewed, with emphasis on the physical mechanisms involved. Magnetic fields can be used during electrodeposition to enhance the deposition rate of magnetic or nonmagnetic species. The effect is attributed to the Lorentz force j boolean ANDB which creates a transverse flow that disrupts the depletion layer near the electrode. The morphology of radially grown electrodeposits is sensitive to magnetic fields when the Lorentz force interferes with natural convection. Fields may also induce atomic-scale texture in alloy films. Some outstanding problems in the field are highlighted. The intersection of magnetism and electrochemistry is an interesting interdisciplinary area which combines several distinct topics, Here we briefly review the whole area, emphasizing magnetic field effects on the electrodeposition of films of magnetic and nonmagnetic materials.
机构:
Waseda Univ, Sch Sci & Engn, Dept Appl Chem, Kagami Mem Lab Mat Sci & Technol,Shinjuku Ku, Tokyo 1698555, JapanWaseda Univ, Sch Sci & Engn, Dept Appl Chem, Kagami Mem Lab Mat Sci & Technol,Shinjuku Ku, Tokyo 1698555, Japan
Yokoshima, T
;
Kaseda, M
论文数: 0引用数: 0
h-index: 0
机构:
Waseda Univ, Sch Sci & Engn, Dept Appl Chem, Kagami Mem Lab Mat Sci & Technol,Shinjuku Ku, Tokyo 1698555, JapanWaseda Univ, Sch Sci & Engn, Dept Appl Chem, Kagami Mem Lab Mat Sci & Technol,Shinjuku Ku, Tokyo 1698555, Japan
Kaseda, M
;
Yamada, M
论文数: 0引用数: 0
h-index: 0
机构:
Waseda Univ, Sch Sci & Engn, Dept Appl Chem, Kagami Mem Lab Mat Sci & Technol,Shinjuku Ku, Tokyo 1698555, JapanWaseda Univ, Sch Sci & Engn, Dept Appl Chem, Kagami Mem Lab Mat Sci & Technol,Shinjuku Ku, Tokyo 1698555, Japan
Yamada, M
;
Nakanishi, T
论文数: 0引用数: 0
h-index: 0
机构:
Waseda Univ, Sch Sci & Engn, Dept Appl Chem, Kagami Mem Lab Mat Sci & Technol,Shinjuku Ku, Tokyo 1698555, JapanWaseda Univ, Sch Sci & Engn, Dept Appl Chem, Kagami Mem Lab Mat Sci & Technol,Shinjuku Ku, Tokyo 1698555, Japan
机构:
Waseda Univ, Sch Sci & Engn, Dept Appl Chem, Kagami Mem Lab Mat Sci & Technol,Shinjuku Ku, Tokyo 1698555, JapanWaseda Univ, Sch Sci & Engn, Dept Appl Chem, Kagami Mem Lab Mat Sci & Technol,Shinjuku Ku, Tokyo 1698555, Japan
Yokoshima, T
;
Kaseda, M
论文数: 0引用数: 0
h-index: 0
机构:
Waseda Univ, Sch Sci & Engn, Dept Appl Chem, Kagami Mem Lab Mat Sci & Technol,Shinjuku Ku, Tokyo 1698555, JapanWaseda Univ, Sch Sci & Engn, Dept Appl Chem, Kagami Mem Lab Mat Sci & Technol,Shinjuku Ku, Tokyo 1698555, Japan
Kaseda, M
;
Yamada, M
论文数: 0引用数: 0
h-index: 0
机构:
Waseda Univ, Sch Sci & Engn, Dept Appl Chem, Kagami Mem Lab Mat Sci & Technol,Shinjuku Ku, Tokyo 1698555, JapanWaseda Univ, Sch Sci & Engn, Dept Appl Chem, Kagami Mem Lab Mat Sci & Technol,Shinjuku Ku, Tokyo 1698555, Japan
Yamada, M
;
Nakanishi, T
论文数: 0引用数: 0
h-index: 0
机构:
Waseda Univ, Sch Sci & Engn, Dept Appl Chem, Kagami Mem Lab Mat Sci & Technol,Shinjuku Ku, Tokyo 1698555, JapanWaseda Univ, Sch Sci & Engn, Dept Appl Chem, Kagami Mem Lab Mat Sci & Technol,Shinjuku Ku, Tokyo 1698555, Japan