Angular distribution of oxide films deposited by multi- or single-component laser ablation

被引:8
作者
Ballesteros, JM
Afonso, CN
Perriere, J
机构
[1] UNIV PARIS 07, PHYS SOLIDES GRP, F-75251 PARIS 05, FRANCE
[2] UNIV PARIS 06, PHYS SOLIDES GRP, F-75251 PARIS 05, FRANCE
关键词
D O I
10.1016/S0169-4332(96)00667-8
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The angular distribution of Bi-Ge-O and Ge-O films prepared by pulsed laser deposition in an oxygen pressure has been studied for different target-substrate distances using two configurations: ablation of multi-component (Bi12GeO20 (EGO) and GeO2) and single-component (Bi and Ge) targets. The results show that the angular distribution of Bi-Ge-O films obtained by alternate ablation of single-component targets is narrower than the one obtained by ablation of the multi-component target. In the case of Ge-O films, in which the multi-component target contains only one cation (Ge), no significant dependence of the angular distribution on the ablation configuration was observed, The results are discussed in terms of the existence of intraplume effects which enhance the broadening effect due to the atmosphere when ablating multi-component targets with two or more cations.
引用
收藏
页码:322 / 326
页数:5
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