Work function determination of zinc oxide films

被引:112
作者
Sundaram, KB
Khan, A
机构
[1] Dept. of Elec. and Comp. Engineering, University of Central Florida, Orlando
[2] Sawtek Inc., Orlando
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1997年 / 15卷 / 02期
关键词
D O I
10.1116/1.580502
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Zinc oxide-silicon heterojunctions were fabricated using both n- and p-type silicon. The zinc oxide films were deposited by the magnetron sputtering process at various substrate temperatures to form these devices. The electrical properties of these devices were measured and the work function of the zinc oxide was evaluated from these properties. (C) 1997 American Vacuum Society.
引用
收藏
页码:428 / 430
页数:3
相关论文
共 12 条