Low temperature deposition of α-Al2O3 thin films by sputtering using a Cr2O3 template

被引：105

作者：

Jin, P

Xu, G

Tazawa, M

Yoshimura, K

Music, D

Alami, J

Helmersson, U

机构：

[1] Natl Inst Adv Ind Sci & Technol, AIST, Moriyama Ku, Nagoya, Aichi 4638560, Japan

[2] Linkoping Univ, Dept Phys, SE-58183 Linkoping, Sweden

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 2002年 / 20卷 / 06期

关键词：

D O I：

10.1116/1.1513641

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A description about low temperature deposition of α-Al2O3 thin films by sputtering was presented. Cr2O3 thin layer was used as a template. Nanoindentation was used to study the mechanical properties of the deposited films. Calculations were made to obtain the hardness and Young's modulus of the films.

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页码：2134 / 2136

页数：3

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