Growth of (211) BaTiO3 thin films on Pt-coated Si(100) substrates by radio frequency magnetron sputtering

被引：6

作者：

Su, QX

Rabson, TA

Robert, M

Xiong, JXZ

Moss, SC

机构：

[1] RICE UNIV,RICE QUANTUM INST,HOUSTON,TX 77005

[2] RICE UNIV,DEPT ELECT & COMP ENGN,HOUSTON,TX 77005

[3] UNIV HOUSTON,TEXAS CTR SUPERCONDUCT,DEPT PHYS,HOUSTON,TX 77204

[4] UNIV HOUSTON,MAT RES SCI & ENGN CTR,HOUSTON,TX 77204

来源：

THIN SOLID FILMS | 1997年 / 305卷 / 1-2期

基金：

美国国家科学基金会;

关键词：

barium oxide; deposition process; sputtering; X-ray diffraction;

D O I：

10.1016/S0040-6090(97)00140-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Thin films of barium titanate (BaTiO3) have been grown on Pt(111)/Si(100) substrates by radio frequency (RF) magnetron sputtering at a substrate temperature of 560-580 degrees C in a mixture of Ar/O-2 atmosphere. Analysis of X-ray diffraction data shows that these films have a single-phase perovskite structure and are tetragonal BaTiO3 with a (211) orientation. The full width at half maximum (FWHM) of the (211) omega-rocking curve is similar to 0.54 degrees. The growth direction of the BaTiO3 (211) lattice planes with respect to the Pt(lll) and Si(100) substrate planes during the sputtering process is characterised in detail by X-ray diffraction theta-2 theta scans for various chi-angles. (C) 1997 Elsevier Science S.A.

引用

页码：227 / 231

页数：5

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